Plasma Etching Processes for Interconnect Realization in VLSI

Written By Nicolas Posseme
Plasma Etching Processes for Interconnect Realization in VLSI
  • Publsiher : Elsevier
  • Release : 14 April 2015
  • ISBN : 0081005903
  • Pages : 128 pages
  • Rating : 4/5 from 21 reviews
GET THIS BOOKPlasma Etching Processes for Interconnect Realization in VLSI


Read or download book entitled Plasma Etching Processes for Interconnect Realization in VLSI written by Nicolas Posseme which was release on 14 April 2015, this book published by Elsevier. Available in PDF, EPUB and Kindle Format. Book excerpt: This is the first of two books presenting the challenges and future prospects of plasma etching processes for microelectronics, reviewing the past, present and future issues of etching processes in order to improve the understanding of these issues through innovative solutions. This book focuses on back end of line (BEOL) for high performance device realization and presents an overview of all etch challenges for interconnect realization as well as the current etch solutions proposed in the semiconductor industry. The choice of copper/low-k interconnect architecture is one of the keys for integrated circuit performance, process manufacturability and scalability. Today, implementation of porous low-k material is mandatory in order to minimize signal propagation delay in interconnections. In this context, the traditional plasma process issues (plasma-induced damage, dimension and profile control, selectivity) and new emerging challenges (residue formation, dielectric wiggling) are critical points of research in order to control the reliability and reduce defects in interconnects. These issues and potential solutions are illustrated by the authors through different process architectures available in the semiconductor industry (metallic or organic hard mask strategies). Presents the difficulties encountered for interconnect realization in very large-scale integrated (VLSI) circuits Focused on plasma-dielectric surface interaction Helps you further reduce the dielectric constant for the future technological nodes

Plasma Etching Processes for Interconnect Realization in VLSI

Plasma Etching Processes for Interconnect Realization in VLSI
  • Author : Nicolas Posseme
  • Publisher : Elsevier
  • Release Date : 2015-04-14
  • Total pages : 128
  • ISBN : 0081005903
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Summary : This is the first of two books presenting the challenges and future prospects of plasma etching processes for microelectronics, reviewing the past, present and future issues of etching processes in order to improve the understanding of these issues through innovative solutions. This book focuses on back end of line (BEOL) ...

Low Energy Electrons

Low Energy Electrons
  • Author : Oddur Ingólfsson
  • Publisher : CRC Press
  • Release Date : 2019-04-23
  • Total pages : 418
  • ISBN : 0081005903
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Summary : Low-energy electrons are ubiquitous in nature and play an important role in natural phenomena as well as many potential and current industrial processes. Authored by 16 active researchers, this book describes the fundamental characteristics of low-energy electron–molecule interactions and their role in different fields of science and technology, including plasma ...

Proceedings International IEEE VLSI Multilevel Interconnection Conference

Proceedings      International IEEE VLSI Multilevel Interconnection Conference
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 1989
  • Total pages : 508
  • ISBN : 0081005903
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Extended Abstracts

Extended Abstracts
  • Author : Electrochemical Society
  • Publisher : Unknown
  • Release Date : 1992
  • Total pages : 212
  • ISBN : 0081005903
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Proceedings

Proceedings
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 1985
  • Total pages : 212
  • ISBN : 0081005903
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JJAP

JJAP
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 1994
  • Total pages : 212
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Dissertation Abstracts International

Dissertation Abstracts International
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2006
  • Total pages : 212
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Optical Microlithography and Metrology for Microcircuit Fabrication

Optical Microlithography and Metrology for Microcircuit Fabrication
  • Author : Michel J. Lacombat,Steve Wittekoek
  • Publisher : Society of Photo Optical
  • Release Date : 1989
  • Total pages : 206
  • ISBN : 0081005903
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Summary : Download or read online Optical Microlithography and Metrology for Microcircuit Fabrication written by Michel J. Lacombat,Steve Wittekoek, published by Society of Photo Optical which was released on 1989. Get Optical Microlithography and Metrology for Microcircuit Fabrication Books now! Available in PDF, ePub and Kindle....

Solid State Technology

Solid State Technology
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 1986
  • Total pages : 212
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1986 Proceedings

1986 Proceedings
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 1986
  • Total pages : 536
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Technical Proceedings

Technical Proceedings
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 1985
  • Total pages : 212
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Masters Abstracts International

Masters Abstracts International
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 1996
  • Total pages : 212
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VLSI Electronics

VLSI Electronics
  • Author : Norman G. Einspruch
  • Publisher : Unknown
  • Release Date : 1981
  • Total pages : 212
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VLSI Electronics without special titles

VLSI Electronics  without special titles
  • Author : Norman G. Einspruch
  • Publisher : Unknown
  • Release Date : 1981
  • Total pages : 212
  • ISBN : 0081005903
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Optoelectronic Interconnects
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 1994
  • Total pages : 212
  • ISBN : 0081005903
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