High Power Impulse Magnetron Sputtering

Written By Daniel Lundin
High Power Impulse Magnetron Sputtering
  • Publsiher : Unknown
  • Release : 13 September 2019
  • ISBN : 0128124547
  • Pages : 398 pages
  • Rating : 4/5 from 21 reviews
GET THIS BOOKHigh Power Impulse Magnetron Sputtering


Read or download book entitled High Power Impulse Magnetron Sputtering written by Daniel Lundin which was release on 13 September 2019, this book published by Unknown. Available in PDF, EPUB and Kindle Format. Book excerpt: High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its real world applications