High Mobility Materials for CMOS Applications

Written By Nadine Collaert
High Mobility Materials for CMOS Applications
  • Publsiher : Woodhead Publishing
  • Release : 29 June 2018
  • ISBN : 0081020627
  • Pages : 384 pages
  • Rating : 4/5 from 21 reviews
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Read or download book entitled High Mobility Materials for CMOS Applications written by Nadine Collaert which was release on 29 June 2018, this book published by Woodhead Publishing. Available in PDF, EPUB and Kindle Format. Book excerpt: High Mobility Materials for CMOS Applications provides a comprehensive overview of recent developments in the field of (Si)Ge and III-V materials and their integration on Si. The book covers material growth and integration on Si, going all the way from device to circuit design. While the book's focus is on digital applications, a number of chapters also address the use of III-V for RF and analog applications, and in optoelectronics. With CMOS technology moving to the 10nm node and beyond, however, severe concerns with power dissipation and performance are arising, hence the need for this timely work on the advantages and challenges of the technology. Addresses each of the challenges of utilizing high mobility materials for CMOS applications, presenting possible solutions and the latest innovations Covers the latest advances in research on heterogeneous integration, gate stack, device design and scalability Provides a broad overview of the topic, from materials integration to circuits

High Mobility Materials for CMOS Applications

High Mobility Materials for CMOS Applications
  • Author : Nadine Collaert
  • Publisher : Woodhead Publishing
  • Release Date : 2018-06-29
  • Total pages : 384
  • ISBN : 0081020627
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Summary : High Mobility Materials for CMOS Applications provides a comprehensive overview of recent developments in the field of (Si)Ge and III-V materials and their integration on Si. The book covers material growth and integration on Si, going all the way from device to circuit design. While the book's focus is ...

Reliability of High Mobility SiGe Channel MOSFETs for Future CMOS Applications

Reliability of High Mobility SiGe Channel MOSFETs for Future CMOS Applications
  • Author : Jacopo Franco,Ben Kaczer,Guido Groeseneken
  • Publisher : Springer Science & Business Media
  • Release Date : 2013-10-19
  • Total pages : 187
  • ISBN : 0081020627
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Summary : Due to the ever increasing electric fields in scaled CMOS devices, reliability is becoming a showstopper for further scaled technology nodes. Although several groups have already demonstrated functional Si channel devices with aggressively scaled Equivalent Oxide Thickness (EOT) down to 5Å, a 10 year reliable device operation cannot be guaranteed anymore due ...

Interface engineered Ge MOSFETs for Future High Performance CMOS Applications

Interface engineered Ge MOSFETs for Future High Performance CMOS Applications
  • Author : Anonim
  • Publisher : Stanford University
  • Release Date : 2009
  • Total pages : 212
  • ISBN : 0081020627
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Summary : As the semiconductor industry approaches the limits of traditional silicon CMOS scaling, introduction of performance boosters like novel materials and innovative device structures has become necessary for the future of CMOS. High mobility materials are being considered to replace Si in the channel to achieve higher drive currents and switching ...

High Mobility Group IV Materials and Devices Volume 809

High Mobility Group IV Materials and Devices  Volume 809
  • Author : Materials Research Society. Meeting
  • Publisher : Unknown
  • Release Date : 2004-08-18
  • Total pages : 304
  • ISBN : 0081020627
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Summary : The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This book, first published in 2004, brings together researchers interested in strained SiGe, strain-relaxed buffers, strained Si on bulk Si and on SOI, SiGe on SOI, Ge substrates, and Ge on insulator....

Ultra Clean Processing of Semiconductor Surfaces X

Ultra Clean Processing of Semiconductor Surfaces X
  • Author : Paul Mertens,Marc Meuris,Marc Heyns
  • Publisher : Trans Tech Publications Ltd
  • Release Date : 2012-04-12
  • Total pages : 356
  • ISBN : 0081020627
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Summary : The International Symposium on Ultra-Clean Processing of Semiconductor Surfaces (UCPSS) is a bi-annual conference which has been organized by IMEC since 1992. Volume is indexed by Thomson Reuters CPCI-S (WoS). The scope of the symposium includes all issues related to contamination, cleaning and surface preparation in mainstream large-scale Integrated Circuit manufacture. ...

High Mobility Strained Si SiGe Heterostructure MOSFETs

High Mobility Strained Si SiGe Heterostructure MOSFETs
  • Author : Christopher William Leitz
  • Publisher : Unknown
  • Release Date : 2002
  • Total pages : 348
  • ISBN : 0081020627
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Summary : (Cont.) Record mobility strained Si p-MOSFETs have been fabricated on relaxed 40% Ge virtual substrates. Hole mobility enhancements saturate at virtual substrate compositions of 40% Ge and above, with mobility enhancements over twice that of co-processed bulk Si devices. In contrast, hole mobility in strained Si p-MOSFETs displays no strong dependence on ...

Advances in GaN GaAs SiC and Related Alloys on Silicon Substrates Volume 1068

Advances in GaN  GaAs  SiC and Related Alloys on Silicon Substrates  Volume 1068
  • Author : Materials Research Society. Meeting Symposium C.
  • Publisher : Materials Research Society
  • Release Date : 2008-08-29
  • Total pages : 289
  • ISBN : 0081020627
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Summary : The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners....

Dielectrics in Nanosystems and Graphene Ge III V Nanowires and Emerging Materials for Post CMOS Applications 3

Dielectrics in Nanosystems  and  Graphene  Ge III V  Nanowires and Emerging Materials for Post CMOS Applications 3
  • Author : Z. Karim
  • Publisher : The Electrochemical Society
  • Release Date : 2011-04-25
  • Total pages : 532
  • ISBN : 0081020627
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Summary : This issue of ECS Transactions will cover the following topics in (a) Graphene Material Properties, Preparation, Synthesis and Growth; (b) Metrology and Characterization of Graphene; (c) Graphene Devices and Integration; (d) Graphene Transport and mobility enhancement; (e) Thermal Behavior of Graphene and Graphene Based Devices; (f) Ge & III-V devices for ...

Technology for SiGe Heterostructure based CMOS Devices

Technology for SiGe Heterostructure based CMOS Devices
  • Author : Mark Albert Armstrong
  • Publisher : Unknown
  • Release Date : 1999
  • Total pages : 154
  • ISBN : 0081020627
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Summary : Bulk silicon is currently the substrate material of choice for the manufacture of high performance digital circuits due to its highly-developed processing technology and the relatively low cost for high-quality substrates. Silicon-based MOSFETs have reached remarkable levels of performance through device scaling. However, with each technology generation, it is becoming ...

McGraw Hill Yearbook of Science and Technology 2010

McGraw Hill Yearbook of Science and Technology  2010
  • Author : McGraw-Hill Education
  • Publisher : McGraw Hill Professional
  • Release Date : 2010-01-12
  • Total pages : 496
  • ISBN : 0081020627
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Summary : Includes coverage of forefront fields such as cell and molecular biology, environmental science, genetics, information technology, nanotechnology, chemistry, and theoretical physics An extensive subject index makes finding information fast and easy Features numerous cross-references to the McGraw-Hill Encyclopedia of Science & Technology and bibliographies of key literature after each article 250+ images, ...

Graphene and III V Channel Metal oxide semiconductor Field effect Devices for Post Si CMOS Applications

Graphene and III V Channel Metal oxide semiconductor Field effect Devices for Post Si CMOS Applications
  • Author : Michael Edward Ramón
  • Publisher : Unknown
  • Release Date : 2013
  • Total pages : 226
  • ISBN : 0081020627
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Summary : To meet the demands for continuous transistor scaling and performance improvements required by the ITRS, there has been a tremendous amount of effort related to alternative high mobility channel materials as potential Si replacements for MOSFET fabrication. Two particularly attractive material systems include III-V substrates and graphene. Thus far, the ...

Advanced Nanoelectronics

Advanced Nanoelectronics
  • Author : Muhammad Mustafa Hussain
  • Publisher : John Wiley & Sons
  • Release Date : 2019-01-04
  • Total pages : 288
  • ISBN : 0081020627
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Summary : Brings novel insights to a vibrant research area with high application potential?covering materials, physics, architecture, and integration aspects of future generation CMOS electronics technology Over the last four decades we have seen tremendous growth in semiconductor electronics. This growth has been fueled by the matured complementary metal oxide semiconductor (...

Annual Review of Materials Research

Annual Review of Materials Research
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2009
  • Total pages : 212
  • ISBN : 0081020627
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Summary : Download or read online Annual Review of Materials Research written by , published by which was released on 2009. Get Annual Review of Materials Research Books now! Available in PDF, ePub and Kindle....

Advanced Gate Stacks for High Mobility Semiconductors

Advanced Gate Stacks for High Mobility Semiconductors
  • Author : Athanasios Dimoulas,Evgeni Gusev,Paul C. McIntyre,Marc Heyns
  • Publisher : Springer
  • Release Date : 2010-11-30
  • Total pages : 384
  • ISBN : 0081020627
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Summary : This book provides a comprehensive monograph on gate stacks in semiconductor technology. It covers the major latest developments and basics and will be useful as a reference work for researchers, engineers and graduate students alike. The reader will get a clear view of what has been done so far, what ...

JJAP

JJAP
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2009
  • Total pages : 212
  • ISBN : 0081020627
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Summary : Download or read online JJAP written by , published by which was released on 2009. Get JJAP Books now! Available in PDF, ePub and Kindle....