Advances in Chemical Mechanical Planarization CMP

Written By Suryadevara Babu
Advances in Chemical Mechanical Planarization  CMP
  • Publsiher : Woodhead Publishing
  • Release : 24 September 2021
  • ISBN : 0128218193
  • Pages : 648 pages
  • Rating : 4/5 from 21 reviews
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Read or download book entitled Advances in Chemical Mechanical Planarization CMP written by Suryadevara Babu which was release on 24 September 2021, this book published by Woodhead Publishing. Available in PDF, EPUB and Kindle Format. Book excerpt: Advances in Chemical Mechanical Planarization (CMP), Second Edition provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The second edition includes the recent advances of CMP and its emerging materials, methods, and applications, including coverage of post-CMP cleaning challenges and tribology of CMP. This important book offers a systematic review of fundamentals and advances in the area. Part one covers CMP of dielectric and metal films, with chapters focusing on the use of current and emerging techniques and processes and on CMP of various materials, including ultra low-k materials and high-mobility channel materials, and ending with a chapter reviewing the environmental impacts of CMP processes. New content addressed includes CMP challenges with tungsten, cobalt, and ruthenium as interconnect and barrier films, consumables for ultralow topography and CMP for memory devices. Part two addresses consumables and process control for improved CMP and includes chapters on CMP pads, diamond disc pad conditioning, the use of FTIR spectroscopy for characterization of surface processes and approaches for defection characterization, mitigation, and reduction. Advances in Chemical Mechanical Planarization (CMP), Second Edition is an invaluable resource and key reference for materials scientists and engineers in academia and R&D. Reviews the most relevant techniques and processes for CMP of dielectric and metal films Includes chapters devoted to CMP for current and emerging materials Addresses consumables and process control for improved CMP, including post-CMP

Advances in Chemical Mechanical Planarization CMP

Advances in Chemical Mechanical Planarization  CMP
  • Author : Suryadevara Babu
  • Publisher : Woodhead Publishing
  • Release Date : 2021-09-24
  • Total pages : 648
  • ISBN : 0128218193
GET BOOK

Summary : Advances in Chemical Mechanical Planarization (CMP), Second Edition provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The second edition includes the recent advances of CMP and its emerging materials, methods, and applications, ...

Advances in Chemical mechanical Planarization

Advances in Chemical mechanical Planarization
  • Author : Rajiv K. Singh,Rajeev Bajaj,Materials Research Society
  • Publisher : Unknown
  • Release Date : 2002
  • Total pages : 41
  • ISBN : 0128218193
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Summary : Download or read online Advances in Chemical mechanical Planarization written by Rajiv K. Singh,Rajeev Bajaj,Materials Research Society, published by which was released on 2002. Get Advances in Chemical mechanical Planarization Books now! Available in PDF, ePub and Kindle....

Advances and Challenges in Chemical Mechanical Planarization

Advances and Challenges in Chemical Mechanical Planarization
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2007
  • Total pages : 371
  • ISBN : 0128218193
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Summary : Download or read online Advances and Challenges in Chemical Mechanical Planarization written by , published by which was released on 2007. Get Advances and Challenges in Chemical Mechanical Planarization Books now! Available in PDF, ePub and Kindle....

Microelectronic Applications of Chemical Mechanical Planarization

Microelectronic Applications of Chemical Mechanical Planarization
  • Author : Yuzhuo Li
  • Publisher : John Wiley & Sons
  • Release Date : 2007-10-19
  • Total pages : 760
  • ISBN : 0128218193
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Summary : An authoritative, systematic, and comprehensive description of current CMP technology Chemical Mechanical Planarization (CMP) provides the greatest degree of planarization of any known technique. The current standard for integrated circuit (IC) planarization, CMP is playing an increasingly important role in other related applications such as microelectromechanical systems (MEMS) and computer ...

Emerging Contaminants

Emerging Contaminants
  • Author : Aurel Nuro
  • Publisher : BoD – Books on Demand
  • Release Date : 2021-05-27
  • Total pages : 332
  • ISBN : 0128218193
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Summary : Emerging Contaminants presents the reader with information on classification, recent studies, and adverse effects on the environment and human health of the main classes of contaminants. Emerging contaminants are synthetic or natural compounds and microorganisms produced and used by humans that cause adverse ecological and human health effects when they ...

Advances in Chemical Mechanical Polishing Volume 816

Advances in Chemical Mechanical Polishing  Volume 816
  • Author : Materials Research Society. Meeting
  • Publisher : Unknown
  • Release Date : 2004-09
  • Total pages : 292
  • ISBN : 0128218193
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Summary : The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This book, first published in 2004, presents advances in fundamental understanding, development, and applications of chemical-mechanical polishing (CMP)....

Advances in CMP Polishing Technologies

Advances in CMP Polishing Technologies
  • Author : Toshiro Doi,Ioan D. Marinescu,Syuhei Kurokawa
  • Publisher : William Andrew
  • Release Date : 2011-11-30
  • Total pages : 328
  • ISBN : 0128218193
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Summary : CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing Technologies for Manufacture of Electronic Devices presents the latest developments and technological innovations in the field – making cutting-edge R&D accessible to the wider engineering community. ...

Wafer Manufacturing Shaping of Single Crystal Silicon Wafers

Wafer Manufacturing  Shaping of Single Crystal Silicon Wafers
  • Author : Imin Cao,Milind Bhagavat
  • Publisher : John Wiley & Sons
  • Release Date : 2021-03-22
  • Total pages : 375
  • ISBN : 0128218193
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Summary : Presenting all the major stages in wafer manufacturing, from crystals to prime wafers. This book first outlines the physics, associated metrology, process modelling and quality requirements and the goes on to discuss wafer forming and wafer surface preparation techniques. The whole is rounded off with a chapter on the research ...

Advanced Nanoscale ULSI Interconnects Fundamentals and Applications

Advanced Nanoscale ULSI Interconnects  Fundamentals and Applications
  • Author : Yosi Shacham-Diamand,Tetsuya Osaka,Madhav Datta,Takayuki Ohba
  • Publisher : Springer Science & Business Media
  • Release Date : 2009-09-19
  • Total pages : 552
  • ISBN : 0128218193
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Summary : In Advanced ULSI interconnects – fundamentals and applications we bring a comprehensive description of copper-based interconnect technology for ultra-lar- scale integration (ULSI) technology for integrated circuit (IC) application. In- grated circuit technology is the base for all modern electronics systems. You can ?nd electronics systems today everywhere: from toys and home ...

Chemical Mechanical Planarization VI

Chemical Mechanical Planarization VI
  • Author : Sudipta Seal
  • Publisher : The Electrochemical Society
  • Release Date : 2003
  • Total pages : 358
  • ISBN : 0128218193
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Summary : Download or read online Chemical Mechanical Planarization VI written by Sudipta Seal, published by The Electrochemical Society which was released on 2003. Get Chemical Mechanical Planarization VI Books now! Available in PDF, ePub and Kindle....

Materials Science and Technology of Optical Fabrication

Materials Science and Technology of Optical Fabrication
  • Author : Tayyab I. Suratwala
  • Publisher : John Wiley & Sons
  • Release Date : 2018-07-30
  • Total pages : 416
  • ISBN : 0128218193
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Summary : Covers the fundamental science of grinding and polishing by examining the chemical and mechanical interactions over many scale lengths Manufacturing next generation optics has been, and will continue to be, enablers for enhancing the performance of advanced laser, imaging, and spectroscopy systems. This book reexamines the age-old field of optical ...

Chemical Mechanical Planarization in IC Device Manufacturing III

Chemical Mechanical Planarization in IC Device Manufacturing III
  • Author : Robert Leon Opila
  • Publisher : The Electrochemical Society
  • Release Date : 2000
  • Total pages : 644
  • ISBN : 0128218193
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Summary : This volume contains the proceedings of the third international symposium on Chemical Mechanical Planarization integrated circuit device manufacturing held at the 196th Meeting of the Electrochemical Society in Honolulu, Hawaii. ( October 20 -22 1999)....

Chemical Mechanical Planarization Volume 867

Chemical Mechanical Planarization  Volume 867
  • Author : Materials Research Society. Meeting
  • Publisher : Cambridge University Press
  • Release Date : 2005-07-19
  • Total pages : 302
  • ISBN : 0128218193
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Summary : Technology requirements associated with the progressive scaling of devices for future technology nodes, coupled with the aggressive introduction of new materials, places tremendous demands on chemical-mechanical polishing. The goal of this 2005 book, which is part of a popular series from MRS, is to bring together experts from a broad spectrum ...

Chemical Mechanical Planarization of Semiconductor Materials

Chemical Mechanical Planarization of Semiconductor Materials
  • Author : M.R. Oliver
  • Publisher : Springer Science & Business Media
  • Release Date : 2013-03-14
  • Total pages : 428
  • ISBN : 0128218193
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Summary : This book contains a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, one of the most exciting areas in the field of semiconductor technology. It contains detailed discussions of all aspects of the technology, for both dielectrics and metals. The state of polishing models and their relation to experimental results are ...

Advances and Challenges in Chemical Mechanical Planarization

Advances and Challenges in Chemical Mechanical Planarization
  • Author : Gerfried Zwicker,Christopher Borst,Laertis Economikos,Ara Philipossian
  • Publisher : Cambridge University Press
  • Release Date : 2007-11-13
  • Total pages : 371
  • ISBN : 0128218193
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Summary : Chemical mechanical planarization (CMP) has been a leading-edge technology in semiconductor processing for the past 15−20 years. A successful CMP process is based in fundamental science across the disciplines of mechanical engineering, chemical engineering, colloid science, materials science and chemistry. Traditionally, the MRS Spring Meeting serves as a nexus for multidisciplinary ...