Advances in Chemical Mechanical Planarization CMP

Written By Suryadevara Babu
Advances in Chemical Mechanical Planarization  CMP
  • Publsiher : Woodhead Publishing
  • Release : 09 January 2016
  • ISBN : 0081002181
  • Pages : 536 pages
  • Rating : 4/5 from 1 reviews
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Read or download book entitled Advances in Chemical Mechanical Planarization CMP written by Suryadevara Babu which was release on 09 January 2016, this book published by Woodhead Publishing. Available in PDF, EPUB and Kindle Format. Book excerpt: Advances in Chemical Mechanical Planarization (CMP) provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The technology has grown to encompass the removal and planarization of multiple metal and dielectric materials and layers both at the device and the metallization levels, using different tools and parameters, requiring improvements in the control of topography and defects. This important book offers a systematic review of fundamentals and advances in the area. Part One covers CMP of dielectric and metal films, with chapters focusing on the use of particular techniques and processes, and on CMP of particular various materials, including ultra low-k materials and high-mobility channel materials, and ending with a chapter reviewing the environmental impacts of CMP processes. Part Two addresses consumables and process control for improved CMP, and includes chapters on the preparation and characterization of slurry, diamond disc pad conditioning, the use of FTIR spectroscopy for characterization of surface processes, and approaches for defection characterization, mitigation, and reduction. Considers techniques and processes for CMP of dielectric and metal films Includes chapters devoted to CMP for particular materials Addresses consumables and process control for improved CMP

Advances in Chemical Mechanical Planarization CMP

Advances in Chemical Mechanical Planarization  CMP
  • Author : Suryadevara Babu
  • Publisher : Woodhead Publishing
  • Release Date : 2016-01-09
  • Total pages : 536
  • ISBN : 0081002181
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Summary : Advances in Chemical Mechanical Planarization (CMP) provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The technology has grown to encompass the removal and planarization of multiple metal and dielectric materials and layers ...

Advances in Chemical mechanical Polishing

Advances in Chemical mechanical Polishing
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2004
  • Total pages : 212
  • ISBN : 0081002181
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Summary : Download or read online Advances in Chemical mechanical Polishing written by , published by which was released on 2004. Get Advances in Chemical mechanical Polishing Books now! Available in PDF, ePub and Kindle....

Advances in Chemical Mechanical Polishing Volume 816

Advances in Chemical Mechanical Polishing  Volume 816
  • Author : Materials Research Society. Meeting
  • Publisher : Unknown
  • Release Date : 2004-09
  • Total pages : 292
  • ISBN : 0081002181
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Summary : The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This book, first published in 2004, presents advances in fundamental understanding, development, and applications of chemical-mechanical polishing (CMP)....

Advances in CMP polishing Technologies for the Manufacture of Electronic Devices

Advances in CMP polishing Technologies for the Manufacture of Electronic Devices
  • Author : Toshiro Doi,Ioan D. Marinescu,Syuhei Kurokawa
  • Publisher : William Andrew
  • Release Date : 2011-12
  • Total pages : 317
  • ISBN : 0081002181
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Summary : CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing Technologies for Manufacture of Electronic Devices presents the latest developments and technological innovations in the field - making cutting-edge R&D accessible to the wider engineering ...

Colloidal Aspects of Chemical Mechanical Planarization CMP

Colloidal Aspects of Chemical Mechanical Planarization  CMP
  • Author : Tanuja Danie Gopal
  • Publisher : Unknown
  • Release Date : 2004
  • Total pages : 262
  • ISBN : 0081002181
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Summary : Download or read online Colloidal Aspects of Chemical Mechanical Planarization CMP written by Tanuja Danie Gopal, published by which was released on 2004. Get Colloidal Aspects of Chemical Mechanical Planarization CMP Books now! Available in PDF, ePub and Kindle....

Colloidal Properties of Alumina Abrasives for Copper Chemical Mechanical Planarization

Colloidal Properties of Alumina Abrasives for Copper Chemical Mechanical Planarization
  • Author : Robin Veronica Ihnfeldt
  • Publisher : Unknown
  • Release Date : 2005
  • Total pages : 250
  • ISBN : 0081002181
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Summary : Download or read online Colloidal Properties of Alumina Abrasives for Copper Chemical Mechanical Planarization written by Robin Veronica Ihnfeldt, published by which was released on 2005. Get Colloidal Properties of Alumina Abrasives for Copper Chemical Mechanical Planarization Books now! Available in PDF, ePub and Kindle....

Advances in Abrasive Based Machining and Finishing Processes

Advances in Abrasive Based Machining and Finishing Processes
  • Author : S. Das,G. Kibria,B. Doloi,B. Bhattacharyya
  • Publisher : Springer Nature
  • Release Date : 2020-05-10
  • Total pages : 271
  • ISBN : 0081002181
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Summary : This book presents the advances in abrasive based machining and finishing in broad sense. Specifically, the book covers the novel machining and finishing strategies implemented in various advanced machining processes for improving machining accuracy and overall quality of the product. This book presents the capability of advanced machining processes using ...

Advances in Chemical Material and Metallurgical Engineering

Advances in Chemical  Material and Metallurgical Engineering
  • Author : Jian Min Zeng,Hong Xi Zhu,Jian Yi Kong
  • Publisher : Trans Tech Publications Ltd
  • Release Date : 2013-01-11
  • Total pages : 4472
  • ISBN : 0081002181
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Summary : Volume is indexed by Thomson Reuters CPCI-S (WoS). The 5 volumes set contains selected, peer reviewed papers from the 2012 2nd International Conference on Chemical, Material and Metallurgical Engineering (ICCMME 2012), December 15-16, 2012, Kunming, P.R. of China. The ICCMME series provide the most up-to-date and authoritative knowledge from both industrial and academic ...

Chemical mechanical Polishing

Chemical mechanical Polishing
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2001
  • Total pages : 212
  • ISBN : 0081002181
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Summary : Download or read online Chemical mechanical Polishing written by , published by which was released on 2001. Get Chemical mechanical Polishing Books now! Available in PDF, ePub and Kindle....

Kona

Kona
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2008
  • Total pages : 212
  • ISBN : 0081002181
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Summary : Download or read online Kona written by , published by which was released on 2008. Get Kona Books now! Available in PDF, ePub and Kindle....

Chemical Mechanical Planarization Volume 867

Chemical Mechanical Planarization  Volume 867
  • Author : Materials Research Society. Meeting
  • Publisher : Cambridge University Press
  • Release Date : 2005-07-19
  • Total pages : 302
  • ISBN : 0081002181
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Summary : Technology requirements associated with the progressive scaling of devices for future technology nodes, coupled with the aggressive introduction of new materials, places tremendous demands on chemical-mechanical polishing. The goal of this 2005 book, which is part of a popular series from MRS, is to bring together experts from a broad spectrum ...

Hazardous and Industrial Wastes

Hazardous and Industrial Wastes
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 1998
  • Total pages : 212
  • ISBN : 0081002181
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Summary : Download or read online Hazardous and Industrial Wastes written by , published by which was released on 1998. Get Hazardous and Industrial Wastes Books now! Available in PDF, ePub and Kindle....

Design and Process Integration for Microelectronic Manufacturing

Design and Process Integration for Microelectronic Manufacturing
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2006
  • Total pages : 212
  • ISBN : 0081002181
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Summary : Download or read online Design and Process Integration for Microelectronic Manufacturing written by , published by which was released on 2006. Get Design and Process Integration for Microelectronic Manufacturing Books now! Available in PDF, ePub and Kindle....

Advances in Abrasive Technology

Advances in Abrasive Technology
  • Author : Anonim
  • Publisher : Unknown
  • Release Date : 2007
  • Total pages : 212
  • ISBN : 0081002181
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Summary : Download or read online Advances in Abrasive Technology written by , published by which was released on 2007. Get Advances in Abrasive Technology Books now! Available in PDF, ePub and Kindle....

Mechanical Aspects of the Material Removal Mechanism in Chemical Mechanical Polishing CMP

Mechanical Aspects of the Material Removal Mechanism in Chemical Mechanical Polishing  CMP
  • Author : Yongsik Moon
  • Publisher : Unknown
  • Release Date : 1999
  • Total pages : 386
  • ISBN : 0081002181
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Summary : Download or read online Mechanical Aspects of the Material Removal Mechanism in Chemical Mechanical Polishing CMP written by Yongsik Moon, published by which was released on 1999. Get Mechanical Aspects of the Material Removal Mechanism in Chemical Mechanical Polishing CMP Books now! Available in PDF, ePub and Kindle....